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工業技術研究院

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雷射直接成像無光罩曝光機

技術簡介

 雷射直接成像無光罩曝光機。
雷射直接成像無光罩曝光機。

隨著半導體製程的精進,高精度無光罩曝光機需求日漸提升,半導體設備廠雖自國外引進無光罩曝光機,卻無法取得技術細節,影響後續研發。

特色與創新

為建立無光罩曝光機核心技術及強化精密半導體設備自主能力,工研院開發雷射直接成像無光罩曝光機關鍵技術,包含高速同步雷射輸出控制,運算效率達20Gpps,雷射掃描點偏移抖動補正後小於1um;即時高精度CCD 曝光校正技術,即時修正機台與光學之誤差,精度達1.25um。

應用與效益

已協助精密製程設備供應業者開發雷射曝光機台,擺脫對國外機台的依賴,自主掌握關鍵技術,並持續進行優化及量產機台開發。



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