工業技術研究院

技術簡介

現有光電、半導體高科技廠房無法突破有效率去除尾氣排放微粒( ＜ PM3)，本技術尾氣處理系統之粉塵捕捉器開發以文丘里原理之窄頸管搭配噴嘴水洗與雙層旋風式粉塵捕捉之方法，建置成工業與高科技廠房PM3減碳排放系統，可大幅提升PM3粉塵捕捉效率達85％以上，有效去除工業級粉塵汙染，以及半導體製程中尾氣產生有害氣體微粒PM3，達致環境友善、淨零排放之功效。本技術以機械式物理性清除替代袋式濾網、化學刷洗等過程，清洗水容易循環再利用，減少水資源以及濾袋等廢棄物之浪費。

Abstract

Existing high-tech optoelectronics and semiconductor factories cannot achieve breakthroughs in effectively removing exhaust emission particles ( ＜ PM3). The dust trap of this exhaust gas treatment system is developed based on the Venturi principle of a narrow neck tube with nozzle water washing and double-layer cyclone dust capture. The method is to build a PM3 carbon emission reduction system for industrial and high-tech factories, which can greatly increase the PM3 dust remove efficiency to more than 85％, effectively remove industrial dust pollution generated from the exhaust gas in the semiconductor manufacturing process. PM3 are reduced to achieve environmental friendliness and net-zero emissions. This technology uses mechanical physical removal to replace bag filters, chemical scrubbing and other processes. The cleaning water can be easily recycled and reused, reducing the waste of water resources and filter bags and other waste.

技術規格

Φ 180 x 1056 mm，可客製化調整容積，乾式、濕式兩用，PM3去除率 ＞ 85％。

Technical Specification

Φ 180 x 1056 mm, the volume can be customized and adjusted, it can be used in both dry and wet types, and the PM3 removal rate is ＞ 85％.

技術特色

透過縮減粉塵流經Venturi pipe (文氏管)截面積，增加渦流流速，藉以提升水霧撞擊粉塵微粒速度，以有效捕捉粉塵。藉由多層次旋風離心分離洗滌，高效率去除PM3以下微粒。設備成本低又環保，且可高效清除大小粉塵。

應用範圍

光電半導體廠尾氣微粒捕集，local scrubber水洗段

接受技術者具備基礎建議（設備）

排氣系統、水洗系統

接受技術者具備基礎建議（專業）

需具備有電控與機械經驗之開發人員

聯絡資訊