Technology Overview
Teaming up with National Chiao Tung University and the National Nano Device Laboratories (NDL), ITRI has developed CINmat for dopant activation for multiple wafers. Now, near non-diffusion could be achieved during annealing by integrating “low-frequency multi-modes” with “microwave restricting” technology to develop accurate and effective low-frequency microwave annealing technology. The uniformity of a single wafer would thus increase from 95% to 99.5%, which is better than the 99% requirement of domestic semiconductor manufacturers.
Applications & Benefits
This technology received an R&D 100 Award in 2017 and can be applied to the optoelectronic industry in future.