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Industrial Technology Research Institute

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Process Simulator for CVD Thin Film Equipment

Technology Overview

Process Simulator for CVD Thin Film Equipment.
Process Simulator for CVD Thin Film Equipment.

A common problem that has vexed epitaxy operators is the need to rely on the experience of operating personnel to determine optimal production parameters. Individual experience often determines the time needed to adjust machines and yield rate. ITRI’s CVD Thin Film Deposition Simulator integrates big data, AI digitized control, and multiple physical coupling simulations to expand approximately 100 sets of manufacturing simulation parameter results to about 1,100 sets via AI algorithm training modules, thus reducing parameter determination time from one week to about two hours and significantly increasing production efficiency. This technology is also used by major companies in Hsinchu Science Park to verify MOCVD GaN and silicon film by multiple physical coupling simulations with an accuracy of over 90%, with a mean thickness error rate maintained below 5%. In addition, ITRI will engage with major equipment companies to promote semiconductor end user applications in the future.

Applications & Benefits

ITRI’s CVD Thin Film Deposition Simulator integrates big data, AI digitized control, and multiple physical coupling simulations to expand approximately 100 sets of manufacturing simulation parameter results to about 1,100 sets via AI algorithm training modules, thus reducing parameter determination time from one week to about two hours and significantly increasing production efficiency.