工業技術研究院

技術簡介

現有光電、半導體高科技廠房無法突破有效率去除尾氣排放微粒，本技術微粒粉塵捕集模組開發，透過湍流撞擊與淋浴噴灑，提升捕集粉塵效率，PM2.5捕集率達89％。粒子偵測範圍5/2.5μm，滿足產線監控需求，有效捕集工業級粉塵汙染，以及半導體製程中尾氣產生有害氣體微粒，達致環境友善、淨零排放之功效。

Abstract

The existing optoelectronic and semiconductor high-tech factories cannot break through the efficient removal of exhaust emission particles. The development of a particulate dust capture module of this technology improves the dust capture efficiency through turbulent impact and shower spraying, with a PM2.5 capture rate of 89％. The particle size detection are 5μm and 2.5μm, which meets the needs of production line monitoring. It can effectively capture industrial-grade dust pollution, and harmful gas particles generated by exhaust gas in the semiconductor manufacturing process. It also achieves environmental friendliness and net-zero emissions.

技術規格

ϕ180x1056 mm，可客製化調整容積，乾式、濕式兩用，PM2.5 捕集率89％。

Technical Specification

ϕ180x1056 mm, the volume can be customized and adjusted, it can be used in both dry and wet types, and the PM2.5 capture rate is 89％.

技術特色

其特色為透過縮減粉塵流經排放管截面積，增加湍流流速，藉以提升淋浴水流撞擊粉塵微粒相對速度與捕集撞擊力，以有效捕捉細微粉塵，高效率捕集PM2.5微粒。設備成本低又環保，且可高效清除大小微粒粉塵。

應用範圍

光電半導體廠尾氣微粒捕集，local scrubber水洗段

接受技術者具備基礎建議（設備）

排氣系統、水洗系統

接受技術者具備基礎建議（專業）

需具備有電控與機械經驗之開發人員

聯絡資訊