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工業技術研究院

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技術名稱: 毒性氫化物乾式潔淨劑製造技術

技術簡介

本技術的一主要目的在提供一種具高吸附容量的用於化學吸附(chemisorption)氫化物氣體之潔淨劑,其不需要添加貴金屬(AgO)或高污染性重金屬(HgO、CdO)等促進劑。本技術的另一目的在提供一種具高吸附容量的用以化學吸附(chemisorption)氫化物氣體之潔淨劑,其使用較低重量百分比的活性成分。上述中所稱氫化物主要來自半導體廠製程廢棄所含之矽烷、二硼烷、磷化氫、砷化氫與四氫化鍺。

Abstract

A cleaning agent for treating harmful gas is disclosed. The cleaning agent has a specific surface measure by BET of at least 60 m2/g and is prepared by coprecipitation. A typical composition of the cleaning agent of the present invention includes 20-65 wt% of an active component of Mn, Cu, Zn , and as a carrier, 10-65 wt% of mesoporous of TiO2 and Al2O3. The cleaning agent of the present invention can remove harmful hydrides such as silanes, germanes, diboranes, phosphines and arsine, from an exhaust from a semiconductor or photoelectric device plants by chemisorption.

技術規格

操作溫度:常溫 處理流量:< 200 L/min 對於AsH3, PH3, SiH4處理效率:> 99%

Technical Specification

Operate temp. : >10 C Volumetric flow-rate : < 200 L/min Removal efficiency for treatingAsH3, PH3, SiH4 : > 99%

技術特色

不需要添加貴金屬(AgO)或高污染性重金屬(HgO、CdO)等促進劑, 製造成本低,環境友善性高

應用範圍

半導體製造業、光電產業之製程尾氣處理

接受技術者具備基礎建議(設備)

接受技術者具備基礎建議(專業)

具有高科技業尾氣處理基本常識者

技術分類 01 綠能環境

聯絡資訊

聯絡人:賴宇倫 空污防制與安全技術組

電話:+886-3-5914703 或 Email:yulunlai@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5820378

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