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工業技術研究院

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技術名稱: 正型感光性聚亞醯胺材料技術

技術簡介

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Abstract

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技術規格

解析能力可達到3μm以下之高解析度,可以鹼性水溶液進行顯影。

Technical Specification

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技術特色

在聚亞醯胺分子主鏈導入特殊設計之感光基團,所研製之感光性聚亞醯胺為正型材料,可用鹼性水溶液顯影,不會有環保問題產生。透過精密之分子結構設計與合成技術,所製備之正型感光性聚亞醯胺其解析度可達3μm,同時保有聚亞醯胺高耐熱與優異之電氣特性。

應用範圍

1. IC元件應力緩衝塗膜(Buffer coat)、IC 元件α-粒子遮蔽塗膜(a-particle barrier) 2. IC元件之層間絕緣膜(Interlayer dielectric)、OLED元件之絕緣膜(Insulator for OLED) 3. FPC保護膜(coverlay)

接受技術者具備基礎建議(設備)

低溫溫控反應器、高分子機械,電性,化學與熱特性分析測試設備、黃光製程設備

接受技術者具備基礎建議(專業)

高分子材料合成與特性測試技術、黃光微影製程技術、半導體與顯示器製程技術

技術分類 電子有機材料

聯絡資訊

聯絡人:楊偉達 電子材料及元件研究組

電話:+886-3-5912979 或 Email:WeitaYang@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5914944

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