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工業技術研究院

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技術名稱: 高精細金屬精密蝕刻技術

技術簡介

適用於CRT網罩與OLED用金屬網罩之高定位精度光罩設計補償資料與批式單片兩段式之高精細蝕刻技術。

Abstract

Precision etching of dynode plate for field emission display, metal mask for OLED.

技術規格

OLED用金屬罩規格為具有最小孔距0.03mm與0.225mm×0.070mm開口之超高精細度網罩。

Technical Specification

Manufacturing of shadow masks for CDT (ColorDisplay Tubes) ,metal mask for OLED, and dynode plate for field emission display.

技術特色

建立場發射電子增益金屬網板兩段式蝕刻技術。技術重點包括有:光罩設計、繪製及複製技術、光蝕刻技術、不銹鋼與INVAR精密蝕刻資料庫、品質保證技術。完成二次電子薄膜鍍膜製程開發及相關性質檢測分析,建立二次電子激發層(MgO & Al2O3)的鍍膜製程及特性研究成果,應用於未來平面光源產品。

應用範圍

◎1"~12"Dynode強化場發射電子增益金屬網板(Dynode plates) ◎12"以上OLED熱蒸鍍用金屬罩(Metal Masks) ◎半導體封裝導線架(Lead Frame)、BGA等 ◎15", 17", 19"監視器彩色顯示管(CDT)用高解析度INVAR網罩 ◎27”以上電視彩色映像管(CPT)用INVAR網罩 ◎20"以上高畫值數位電視(HDTV)之CPT用INVAR網罩

接受技術者具備基礎建議(設備)

光點雷射繪圖機、板片清洗線、濕式光阻塗佈線、曝光/顯影線、蝕刻/剝膜線、精密檢測設備。

接受技術者具備基礎建議(專業)

化工、機械、材料

技術分類 金屬材料

聯絡資訊

聯絡人:黃振東 金屬材料研究組

電話:+886-3-5916989 或 Email:J.D.Hwang@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5820207

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