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工業技術研究院

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技術名稱: 高純度電子用鋁素箔製程技術

技術簡介

適用250V以下鋁電解電容器陽極板用鋁箔之鑄胚連鑄至100μm製程技術,包括鑄胚連鑄軋延製程參數與板形控制、退火製程參數與晶粒方向控制、強度/晶粒方向與蝕刻性關係,及連續製程設計技術。

Abstract

The processes of continuous casting, precision rolling, heat treatment, and etching of aluminum foil for capacitor.

技術規格

250V以下鋁電解電容器陽極板用鋁箔之鑄胚連鑄、99.8→99.99%鋁純化、軋延至100μm製程技術

Technical Specification

Purity : 99.99%, thickness : 100£gm.

技術特色

低壓電容器用硬質鋁箔及高壓電容器用軟質鋁箔由4N鋁鑄胚連鑄到100μm連續製程技術,硬質箔130MPa/<220> texure 80%以上,軟質箔60MPa/<200> texure 80%以上。

應用範圍

電子產業用之鋁電解電容器陽極、Li電池負極用原材製造業,其他電子電機產品用鋁箔原材製造業。

接受技術者具備基礎建議(設備)

20 Hmill,連續脫脂防蝕設備,連續爐(退火),4 Hmill

接受技術者具備基礎建議(專業)

冶金科系相關背景人力

技術分類 金屬材料

聯絡資訊

聯絡人:曹申 金屬材料研究組

電話:+886-3-5914159 或 Email:ShenTsao@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5820207

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