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工業技術研究院

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技術名稱: 高密度電漿鍍膜技術

技術簡介

開發以脈衝雷射電弧鍍膜(Pulse Laser Arc Deposition)技術,在微細鑽頭表面成長氮化物多層複合薄膜,及其線上壽命測試分析。

Abstract

The pulse laser arc deposition system has been scaled up from the laboratory level to an industrial prototype.

技術規格

多層奈米複合薄膜之薄膜表面硬度值> 40 GPa,薄膜表面平均粗糙度Ra<0.05μm。

Technical Specification

Properties of the multi-layer coating : hardness!O 40 GP, roughness Ra!O0.05£gm.

技術特色

可在金屬及矽基板複材沉積高熱傳導係數薄膜、高純度高硬度類鑽膜以及DLC/CrC/CrN等多層奈米複合薄膜等技術。應用電弧鍍膜裝置完成蒸鍍多層奈米複合薄膜於0.8mmf 微細鑽頭。

應用範圍

應用於現有之PCB高速精密加工之微細鑽頭、壓鑄件成形加工刀具產品、硬碟讀取頭元件、生物醫療器材及各種精密模具等的表面改質鍍膜。此外;低溫成長功能性氧化物薄膜亦是其特殊之應用領域。

接受技術者具備基礎建議(設備)

真空電弧離子鍍膜機、鍍膜製程技術

接受技術者具備基礎建議(專業)

真空電弧離子鍍膜應用/製造經驗

技術分類 金屬材料

聯絡資訊

聯絡人:呂明生 金屬材料研究組

電話:+886-3-5915214 或 Email:menson@itri.org.tw

客服專線:+886-800-45-8899

傳真:.

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