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工業技術研究院

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技術名稱: 晶圓表面光阻去除效率檢測技術

技術簡介

1. NANOSPEC (光學薄膜測厚儀 ):非接觸,非破壞方式量測,無須樣品的前處理,反射光譜400nm~800nm,解析度5A 。 2. TDS(熱脫附常壓游離質譜儀):常壓下操作,偵測分子量範圍10~200。

Abstract

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技術規格

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Technical Specification

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技術特色

1. 屬於非接觸,非破壞方式量測,無須樣品的前處理。 2. 可在常壓下操作。

應用範圍

可應用於半導體、 LCD製造業等材質表面清洗效率驗證分析。

接受技術者具備基礎建議(設備)

具備電子級清洗製程機台之設備業者為佳。

接受技術者具備基礎建議(專業)

具備電子級清洗製程機台之設備業者為佳。

技術分類 工程與自動化研究

聯絡資訊

聯絡人:徐靜怡 水科技與環境分析技術組

電話:+886-3-5732624 或 Email:hsuchingyi@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5732349

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