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工業技術研究院

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技術名稱: 利用EBDW曝顯Sub-32nm接觸孔洞製程技術

技術簡介

32奈米接觸孔洞可以由電子束直寫微影技術曝顯產生, 對於發展週期較慢的各種電子或光電元件原型開發技術應用將是非常理想的製程工具.

Abstract

Sub-32nm Contact-Hole made by EBDW. Electronic and Optoelectronic Device Prototyping Application with Slower Cycle Time could Use This Process Technology as a High Resolution Lithography Tool.

技術規格

孔徑/孔距小於1/3(或更稀疏)的小於32奈米直徑的接觸孔洞陣列可以達成. 接受技術者具備基礎建議(設備) :

Technical Specification

Sub-32nm Diameter Contact-Holes with Via Size/Space Ratio Smaller Than 1/3 (More Sparse Array) Could be Obtained.

技術特色

超高解析度EBDW接觸孔洞微距微影製程技術

應用範圍

CMOS 32nm Node Interconnect接觸孔洞製程技術、光阻廠商開發高電子束敏感光阻材料、非揮發性記憶體32以下奈米接觸面積製造製程、32nm Node奈米壓印模仁(Mold)製作

接受技術者具備基礎建議(設備)

具CMOS元件開發能力之半導體廠, 光阻製造廠, 壓印技術Tool Vendor.

接受技術者具備基礎建議(專業)

CMOS製程技術相關元件之設計、製造能力, 光阻製造技術, 壓印模仁製造技術

技術分類 製程

聯絡資訊

聯絡人:鍾佩翰 奈米電子技術組

電話:+886-3-5912777 或 Email:stephen.chung@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5917690

[{"text":"企業網","weight":13.0},{"text":"材化所","weight":11.5},{"text":"機械所","weight":10.0},{"text":"綠能所","weight":9.4},{"text":"生醫所","weight":8.0},{"text":"半導體","weight":6.2},{"text":"南分院","weight":5.0},{"text":"太陽能","weight":5.0},{"text":"課程","weight":5.0},{"text":"遠紅外線","weight":5.0},{"text":"雷射","weight":4.0},{"text":"LED","weight":4.0},{"text":"LED可見光","weight":3.0},{"text":"5G","weight":3.0},{"text":"工研人","weight":3.0},{"text":"電光所","weight":3.0},{"text":"綠能與環境研究所","weight":3.0},{"text":"機械","weight":3.0},{"text":"資通所","weight":2.0},{"text":"面板","weight":2.0},{"text":"文字轉語音","weight":2.0},{"text":"實習","weight":2.0},{"text":"無人機","weight":2.0},{"text":"生醫","weight":2.0},{"text":"3D","weight":2.0},{"text":"v2x","weight":2.0},{"text":"員工","weight":2.0},{"text":"地圖","weight":2.0},{"text":"太陽光電","weight":2.0},{"text":"材料與化工研究所","weight":1.0}]