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工業技術研究院

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技術名稱: 含微粒處理單元之全氟化物觸媒處理方法

技術簡介

可同時處理含過氟化物(PFC, CHF3, NF3, SF6)、微米/深次微米微粒、SiH4、TEOS的製程尾氣,處理程序電熱-微粒處理-觸媒-水洗。

Abstract

This apparatus can dispose of waste gases including PFCs, particles (diameter from micrometer to nanometer), SiH4 and TEOS simultaneously. The disposal procedure of the system is electrothermal unit – particle trap – catalyst bed – wet scrubber.

技術規格

系統操作溫度:450℃~800℃,微粒處理粒徑範圍:0.01μm~10μm,處理廢氣風量範圍:30~250 lpm。

Technical Specification

Operation temperature: 450~800℃, Removed particle size: 0.01μm~10μm, Flow rate of waste gas: 30~250 lpm.

技術特色

同時處理含過氟化物、深次微米微粒、SiH4/TEOS等廢氣的觸媒系統處理設備。

應用範圍

光電、半導體業之薄膜製程及乾蝕刻製程所排放之廢氣處理

接受技術者具備基礎建議(設備)

廢氣處理設備

接受技術者具備基礎建議(專業)

熟悉高科技業之製程氣體處理

技術分類 02 N空氣污染防治

聯絡資訊

聯絡人:游生任 空污防制與安全技術組

電話:03-5914928 或 Email:YSJ@itri.org.tw

客服專線:+886-800-45-8899

傳真:03-5820378

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