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工業技術研究院

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技術名稱: 單點迴轉式電漿頭設計技術

技術簡介

一種單旋轉電漿機制,用以可旋轉地設置於一噴射式電漿系統中,電漿係經由直形通道噴出,避免因為加大處理面積而降低改質效能,本系統的工作範圍(直徑)能提升到20~30mm,適合高速處理樣品,具有良好的電漿效能。

Abstract

A casing is used for being rotatably disposed in a jet type plasma system. The plasma generated by the jet type plasma system jets out via the straight-shaped passage. Which can increase the working area and efficiency.

技術規格

操作頻率 20~40KHz, 可使用氣體源: CDA,N2,O2…,工作範圍 直徑: ~20mm(單迴轉)

Technical Specification

Frequency: 20~40KHz, Working gas: CDA, N2, O2, Dia. ~20mm(single Head)

技術特色

採用直流(單迴轉)或交流馬達(雙迴轉),透過傳動元件的作用,使得電漿源產生旋轉運動,搭配電漿源幾何尺寸設計,來放大處理面積

應用範圍

表面改質,清潔,黏著強度提升

接受技術者具備基礎建議(設備)

個人電腦,機械繪圖設計軟體

接受技術者具備基礎建議(專業)

機械與理工相關背景

技術分類 LCD設備業

聯絡資訊

聯絡人:劉志宏 先進製造核心技術組

電話:+886-3-5918796 或 Email:stanliu@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5820252

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