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工業技術研究院

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技術名稱: 大氣電漿大幅寬處理裝置設計技術

技術簡介

一種大氣電漿大幅寬處理裝置,電漿產生器相對中心軸係向外傾斜一角度。當旋轉輸出端帶動電漿產生器轉動時,電漿產生器之電漿噴束係斜向從電漿噴嘴離開,進而加大電漿處理之面積,單一系統作面直徑可達130mm.

Abstract

A wide area atmospheric pressure plasma jet apparatus. The rotation output end drives the plasma-generating devices to rotate, plasma is obliquely ejected from the plasma nozzle due to the tilt of the plasma-generating devices, so as to increase the area to be processed. The treatment diameter of one plasma module is 130mm.

技術規格

操作頻率 20~40KHz, 可使用氣體源: CDA,N2,O2…,工作範圍 :直徑:130mm(雙迴轉)

Technical Specification

Frequency: 20~40KHz, Working gas: CDA, N2, O2, Working Dia. :130mm(Twin Head)

技術特色

電漿系統偏心向外吹送,加大作用面積並降低污染議題

應用範圍

表面改質,清潔,黏著強度提升

接受技術者具備基礎建議(設備)

個人電腦,機械繪圖設計軟體,電子電路設計軟體

接受技術者具備基礎建議(專業)

機械與理工相關背景

技術分類 LCD設備業

聯絡資訊

聯絡人:劉志宏 先進製造核心技術組

電話:+886-3-5918796 或 Email:stanliu@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5820252

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