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工業技術研究院

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技術名稱: 透明高阻氣膜

技術簡介

應用ALD技術,透過基材選擇、製程控制、界面改質、結構設計,開發超高阻氣、透明、可撓之阻氣膜。可應用於軟性電子之基材及封裝膜,加速軟電之市場化步伐。

Abstract

none

技術規格

氧氣穿透率<0.01 cc/m2-day-atm,水蒸氣穿透率<0.01 g/m2-day,光穿透率90%

Technical Specification

none

技術特色

ALD之成膜缺陷密度極低,均勻度優良,低溫沈積的特點,較之現存所有封裝成膜技術更有希望達成軟電封裝的嚴格要求。在軟性高分子基材上形成透明、極薄之阻氣層,透過基材選擇、製程控制、界面改質、結構設計,可以透過精密製程達成超高阻氣 。

應用範圍

觸控面板、電子紙、OLED、OPV之基材及封裝膜。

接受技術者具備基礎建議(設備)

阻氣量測及手套箱

接受技術者具備基礎建議(專業)

真空技術

技術分類 高分子材料

聯絡資訊

聯絡人:龔丹誠 高分子研究組

電話:+886-3-5732895 或 Email:dankong@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5732347

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