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工業技術研究院

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技術名稱: 一種面型蒸鍍源及其蒸鍍方法與系統

技術簡介

擬蒸鍍材料預混後塗佈於耐溫平版上,藉由加熱器加熱後將擬鍍物蒸鍍於基材上,其中耐溫平板可為可撓性基材、藉由機械力捲動以實現連續蒸鍍。

Abstract

To premix the organic material and to coat on the source plate, and then to evaporate the material on the substrate by the heater heating the source plate. The source plate can be flexible, and it can be used by roll to roll evaporation system to continue evaporated.

技術規格

可鍍膜材料:有機薄膜 基板溫度:<30°C 基板材料:玻璃 or 可撓基板 膜厚:<50~300nm

Technical Specification

evaporated material : organic thin film, substrate temp.<30°C, substrate:glass or flexible substrate film thickness:<50~300nm

技術特色

此技術解決點蒸鍍機材料利用率低的問題,材料利用率可提升至65~75%,降低設備與材料成本,同時可結合連續式蒸鍍源及蒸鍍源尺寸可調控,以達到roll-to-roll 連續式之蒸鍍製程。

應用範圍

OLED光電產業

接受技術者具備基礎建議(設備)

蒸鍍機設備

接受技術者具備基礎建議(專業)

機械、薄膜鍍膜技術

技術分類 光電與半導體製程設備

聯絡資訊

聯絡人:董福慶 新興能源機械技術組

電話:03-5916489 或 Email:fctung@itri.org.tw

客服專線:+886-800-45-8899

傳真:03-5910350

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