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工業技術研究院

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技術名稱: 化學水浴法鍍膜設備

技術簡介

本發明提供一種化學水浴法(chemical bath deposition)鍍膜設備,包括:一第一蓋板與一第二蓋板,其中第一蓋板與第二蓋板係對應設置,且第一蓋板具有至少兩個孔洞(hole);以及一間隙物(spacer),設置於第一蓋板與第二蓋板之間,其中由第一蓋板、第二蓋板與間隙物構成一鍍膜空間。

Abstract

The invention provides a film deposition apparatus, which comprises a first cover and a second cover, wherein the top cover and the bottom cover are disposed to each other, and the first cover has at least two holes; and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover forms an film deposition space.

技術規格

相較於傳統製程節省70%溶液使用量, 並縮短製程時間50%

Technical Specification

Compared to traditional process, 70% solution and 50% process time were saved

技術特色

設備設計簡單, 鍍面朝上, 無溶液乘載容器, 基板直接加熱

應用範圍

水浴法鍍膜

接受技術者具備基礎建議(設備)

具設備製造背景

接受技術者具備基礎建議(專業)

具化學及太陽能相關背景

技術分類 02 R太陽光電技術

聯絡資訊

聯絡人:徐為哲 太陽光電技術組

電話:+886-6-3636857 或 Email:hsuweitse@itri.org.tw

客服專線:+886-800-45-8899

傳真:

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