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工業技術研究院

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技術名稱: 化學水浴法鍍膜設備

技術簡介

一種化學水浴法鍍膜設備,包括化學水浴法鍍膜設備,包括第一蓋板、第二蓋板與溶液出入裝置。第一蓋板與第二蓋板對應設置,構成鍍膜空間。溶液出入裝置位於第一蓋板中,供溶液進出鍍膜空間。溶液出入裝置的位置為固定或可以在該鍍膜空間內移動。

Abstract

A chemical bath deposition (CBD) apparatus including a first cap, a second cap, and a solution input/output device. The second cap is arranged corresponding to the first cap so as to form a deposition space. The solution input/output device is located in the first cap so as to feeding solution into /out the deposition space. The position of the solution input/output device is fixed, or the the solution input/output device can move in the deposition space.

技術規格

鍍面朝上, 無溶液乘載容器, 基板直接加熱

Technical Specification

dry in dry out

技術特色

設備設計簡單, 鍍面朝上, 低能耗

應用範圍

水浴法鍍膜

接受技術者具備基礎建議(設備)

具設備製造背景

接受技術者具備基礎建議(專業)

具化學及太陽能相關背景

技術分類 02 R太陽光電技術

聯絡資訊

聯絡人:徐為哲 太陽光電技術組

電話:06-3636857 或 Email:hsuweitse@itri.org.tw

客服專線:+886-800-45-8899

傳真:

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