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工業技術研究院

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技術名稱: 微米/次微米高分散性銅粉開發

技術簡介

本技術為具高分散性之微米以及次微米級銅粉製作方式,將可提供業者因應銅膠開發時所需導電粒子技術來源,本技術揭露三種尺寸: ~500nm、~1μm以及~2μm奈米級及次微米級細銅粉之前驅物製作方式以及相關還原技術。

Abstract

In this report, we provide some synthesis and ink preparation methods for three different size :0.5μm、1μm、2μm , Cu/CuO particles, and describe the fundamental theories for particle dispersion, aggregation, and reduction.

技術規格

開發三種尺寸: ~500nm、~1μm以及~2μm奈米級及次微米級細銅粉及其前驅物製作方式以及相關還原技術

Technical Specification

Three different size :0.5μm、1μm、2μm , Cu/CuO particles, and describe the synthesis and reduction method.

技術特色

銅粉及銀粉的導電性幾乎一樣,但銅成本僅為銀的1/100。純銅粉有良好的導電和導熱性能,本技術已成功開發低成本的溼式非真空製備銅及氧化銅之奈米/微米化粒子技術,可望取代昂貴的銀粉作為多用途之高附加價值導電材料。

應用範圍

純銅粉有良好的導電和導熱性能,常用於國防、電氣工業和電子工業。與錫、鋅、鎳等的銅合金粉廠用於製作結構零部件、摩擦材料及導電用之漿料。可應用在半導體、面板、太陽光電等領域

接受技術者具備基礎建議(設備)

具基礎化學合成設備即可。

接受技術者具備基礎建議(專業)

具粉末合成經驗及相關材料分析經驗之廠商尤佳。

技術分類 01 綠能環境

聯絡資訊

聯絡人:謝東坡 太陽光電技術組(R)

電話:+886-3-5914414 或 Email:TP@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5822157

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