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工業技術研究院

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技術名稱: 熱寫微影設備與製程技術

技術簡介

熱寫微影系統搭配超解析熱寫微影製程可有效突破光學微影之繞射極限大幅縮小雷射曝光光點,並可以低成本製程加工出功能性奈米級圖案,已供不同領域之應用

Abstract

The thermal lithography instrument combination with super resolution thermal mode lithography technology can effectively overcome diffraction limit of optical lithography, effectively reduce the size of laser spot and enable the low-cost supply of functional nano structure patterns as well as has high potential for different areas applications.

技術規格

(1)由工研院電光所所開發之小型化405nm藍光雷射直寫微影光機模組系統與其相關之伺服控制電路系統安裝於高精度奈米移動平台上進行系統整合測試,實驗證實該系統可產生大小約260nm之理想且精細之雷射光點供熱寫光阻曝光。 (2)搭配工研院電光所開發的專利材料,一種可以達到雷射微影繞射極限的特殊熱寫微影光阻材料,這材料經過上述405nm雷射直寫微影系統曝光與後續性製程處理,便可得到150奈米以下的圖案。

Technical Specification

(1)Small size prototype 405nm blue laser lithography opto-mechanical module and related servo control system developed by ITRI/EOL are installed to the precision nano-stage systems for system integration testing and may produce an ideally narrow round shape exposure beam spot about 260nm for thermal lithography photoresist exposure. (2)Along with the patented material developed by ITRI’s Electronics and Optoelectronics Research Labortories, a special type of thermal lithography photoresist material that can reach the optical diffraction limit of lithography was developed. After exposure by 405nm laser beam direct-write lithography instrument and follow-up processing, patterns on the scale of 150 nanometers or less can be achieved.

技術特色

‧熱寫式無機光阻材料製程技術藉由業界科專授權予國內藍光光碟母模刻版廠商測試驗證,後續將結合業者之光碟刻版設備進行驗證,利用新型熱寫入法進行藍光光碟母模之開發 ‧此計畫所開發之雷射直寫光機模組成功應用於中研院物理所奈米級像散式量測系統,利用此類似光學讀取頭之模組作為偵測奈米長度的核心技術,垂直解析度有機會達到0.03奈米,設備價值可降低至30萬台幣

應用範圍

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接受技術者具備基礎建議(設備)

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接受技術者具備基礎建議(專業)

none

技術分類 醫療電子

聯絡資訊

聯絡人:林仁傑 生醫資電技術組(0M000)

電話:+886-3-5500776*7890 或 Email:jenchiehlin@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5829781

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