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工業技術研究院

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技術名稱: 高分散性奈米氧化銅粉材與漿料開發

技術簡介

本技術為具高分散性之奈米級氧化銅粉製作方式,將可提供業者開發銅奈米粒子所需導電粒子技術來源,本技術揭露尺寸小於100nm之氧化銅粉及其前驅物製作方式以及相關調配漿料技術。

Abstract

In this report, we provide some synthesis and ink preparation methods for nano-size <100nm CuO particles, and describe the fundamental theories for particle dispersion, aggregation, and reduction.

技術規格

開發奈米尺寸: <100nm之氧化銅粉及其前驅物製作方式以及相關調配漿料技術

Technical Specification

The report of preparation Copper oxide (particle size :<100nm), and describe the synthesis and reduction method.

技術特色

氧化銅為銅粉之重要前驅物之一,銅粉及銀粉的導電性幾乎一樣,但銅成本僅為銀的1/100。純銅粉有良好的導電和導熱性能,本技術已成功開發低成本的溼式非真空製備氧化銅之奈米化粒子技術,可望取代昂貴的銀粉作為多用途之高附加價值導電材料。

應用範圍

氧化銅為銅粉之重要前驅物之一,而純銅粉有良好的導電和導熱性能,常用於國防、電氣工業和電子工業。與錫、鋅、鎳等的銅合金粉廠用於製作結構零部件、摩擦材料及導電用之漿料。可應用在半導體、面板、太陽光電等領域

接受技術者具備基礎建議(設備)

具基礎化學合成設備即可

接受技術者具備基礎建議(專業)

具粉末合成經驗及相關材料分析經驗之廠商尤佳。

技術分類 01 綠能環境

聯絡資訊

聯絡人:謝東坡 太陽光電技術組(R)

電話:+886-3-5914414 或 Email:TP@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5822157

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