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工業技術研究院

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技術名稱: 大氣電漿源模組技術

技術簡介

建構大氣電漿源模組技術,開發乾式電漿於半導體或光電產業之表面前處理技術取代傳統濕式前處理製程,能提高塗料或異質材料接著物之附著性。一般濕式前處理技術溶劑對人體與環境均有破壞性的影響,廢液回收不易。

Abstract

The atmospherice pressure plasma technique as the dry process was built for surface pre-treatment replaced the traditional wet pre-treatment process. The adhesion between substrate and ink can be improved by atmospheric pressure plasma process.

技術規格

1.電漿產生器頻率為20kHz至25kHz 2.提供瓦數由1000W至2000W 3.功能可為1對1電漿噴嘴或1對2電漿噴嘴 4.整合式氣流控制系統 5.智慧控制系統

Technical Specification

1.The frequency range of generator between 20kHz and 25kHz 2.Power provided up to 1000W to 2000W

技術特色

提供最佳之電漿處理效能以及整線之大氣電漿系統,確保製程規格一致化

應用範圍

半導體、光電產業、紡織業、汽車業LED封裝產業

接受技術者具備基礎建議(設備)

大氣電漿表面前處理設備

接受技術者具備基礎建議(專業)

化學、機械、電漿技術

技術分類 光電與半導體製程設備

聯絡資訊

聯絡人:楊國煇 先進製造核心技術組

電話:03-5918610 或 Email:evalee@itri.org.tw

客服專線:+886-800-45-8899

傳真:03-5820252

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