工業技術研究院

技術簡介

本技術可突破現有大面積AMOLED蒸鍍製程用之精密金屬遮罩技術之極限，並且建立相關製程設計、Metal mask精密微成型等相關之參數資料庫。 大尺寸精密金屬遮罩由於太薄，中間部分因重力下陷而無法正確地蒸鍍，故需分成幾個不同金屬遮罩，以SMS(Small Mask Scanning)小光罩掃描式的方式蒸鍍發光物質，並搭配LITI(Laser Induced Thermal Image)雷射熱轉換成像蒸鍍技術以達到精確大面積蒸鍍製程。

Abstract

This technology can break through the size limits of precision metal mask and also established the database for relevant precision micro-molding process design. The center of a large area FMM is very easy to have a gravitational concave and will affect the position accuracy of color pattern‘s vapor deposition.In the larger AMOLED panel‘s fabrication by using SMS method with LITI process is a better solution for color patterning .This SMS fabrication technology is now well developed by ITRI MCL and is very helpful to Taiwan‘s domestic OLED industry.

技術規格

本技術AMOLED TV用熱蒸鍍金屬遮罩，相關技術規格如下: 1.蒸鍍罩尺寸: 200X700 mm2。 2.材質：30μm板厚之精密蝕刻級Invar金屬板。 3.開孔精度≦ ±1μm。 4.位置累積精度≦ ±10μm。

Technical Specification

Technical specifications: 1.Fine metal mask size: 200 X 700 mm2. 2.Material: 30μm thick Invar plate for precisely etching process. 3.The opening precision: ≦ ± 1μm. 4.Cumulative location accuracy: ≦ ± 10μm.

技術特色

本AMOLED高精細蒸鍍製程金屬遮罩(FMM)製作技術之最大特色：在於應用工研院先前針對監視器網罩所開發建立國內唯一之兩階段蝕刻技術。 蒸鍍罩尺寸：500*600mm2；材質：精密蝕刻級Invar金屬板；蒸鍍罩厚度：30μm；開孔精度：≦±3μm；位置累積精度：≦±10μm The most significant feature of AMOLED fine metal mask (FMM) fabrication technique was applied the 2-step etching method which was previously developed for the CDT shadow mask in ITRI MCL. Metal Mask Size：500 * 600mm2 ；Material：Invar metal plate(Precision Etching grade) ；Metal Mask thickness：30μm ；Aperture tolerance：≦ ± 3μm ；Location accumulative tolerance：≦ ± 10μm

應用範圍

OLED Display、OLED Lighting 金屬蒸鍍遮罩、太陽能網印用網版、 觸控螢幕金屬線、軟性顯示器產品。 Fine Metal Mask, Solar cell print plate, Touch panel metal mesh, flexible electronics.

接受技術者具備基礎建議（設備）

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接受技術者具備基礎建議（專業）

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