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工業技術研究院

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技術名稱: 光電半導體薄膜量測技術

技術簡介

1. 量測技術應用在半導體產業上,我們發展顯微光譜反射儀技術,以低收光角架構搭配離散傅立葉轉換技術,可以在<1sec同時量測矽穿孔深度、薄膜厚度、和孔徑尺寸等多參數的效能,矽穿孔深寬比達到10:1,薄膜厚度量測範圍涵蓋0.05um至100um。 2. 量測技術應用在R2R製程上,我們發展了光譜反射儀技術,搭配領先國際的高速光譜擬合技術,在極薄膜上(膜厚<500nm)對於膜層振動免疫,補足產業無法in-line量測振動極薄膜的缺口。 3. 在高解析度FPD和AMOLED Array段製程上,低溫多晶矽(LTPS)製程是趨勢,我們發展了領先全球的散射影像量測技術,利用偏光影像拉高晶格不均勻對比,能夠在2 min量完整片3.5代玻璃,補足產業無法監控LTPS品質的問題。 4. 在高解析度IPS新興光配向製程上,我們發展了高收光角偏光暗場技術,能夠在一次取像獲得異向性和配向角,能夠運用在產線real panel的異向性量測,補足產業只能量測素玻璃之異向性的缺口,真正落實產線應用。

Abstract

1.For semiconductor industry, we develop micro spectral reflectrometer. Using low numerical aperture optical system and discrete Fourier transform technology, hybrid parameter, e.g. depth of TSV, thin-film thickness, and critical dimension can be measured within 1 sec. 2.For R2R industry, we develop the leading in-line reflectrometer. Using high-speed curve fitting algorithm, the ultra-thin-film(<500nm) can be measured in R2R vibration condition. 3.For FPD and AMOLED LTPS fabrications, we develop the leading scattering image measurement technology. Using polarization image to enhance contrast of crystal defect, the G3.5 glass can be in-line monitored within 2 min. 4.For FPD optical alignment fabrication, we develop the leading high numerical polarized dark field anisotropic material measurement technology. Our technology can measure the anisotropic properties of real panel.

技術規格

1. 光譜反射儀膜厚量測範圍: 10nm~100μm,TSV深寬比: 1:15 2. 散射影像量測技術: <2min (G3.5),LTPS均勻性檢測再現性:JND≦0.05 3. 異向性量測技術: Alignment angle range: 0~360 deg., Anisotropy measurement range: 0~180 deg.

Technical Specification

1. Spectral reflectometer: thickness range: 10nm~100μm,TSV aspect ratio: 1:15 2. Scattering Image measurement Technology: Tact time<2min (G3.5),LTPS uniformity reproducibilityJND≦0.05 3. Anisotropic Material Measurement Technology: Alignment angle range: 0~360 deg., Anisotropy measurement range: 0~180 deg.

技術特色

同技術簡介

應用範圍

1.半導體和3D IC的矽穿孔深度和膜厚量測設備 2.R2R製程和顯示器薄膜特性(n/k/d)量測設備 3.顯示器Color Filter穿透率色度量測設備 4.LTPS製程產線膜層均勻性監控設備 5.光配向製程產線異向性量測設備

接受技術者具備基礎建議(設備)

1. 光譜儀 2. 顯微鏡組 3. 潔淨室

接受技術者具備基礎建議(專業)

1. 薄膜干涉光學背景 2. Lens Design背景 3. 物理光學背景

技術分類 先進檢測與感測儀器- 檢測/設備技術

聯絡資訊

聯絡人:劉志祥 量測技術發展中心

電話:+886-3-5732038 或 Email:ChihShangLiu@itri.org.tw

客服專線:+886-800-45-8899

傳真:none

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