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工業技術研究院

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技術名稱: 高穿透度光學擴散片製程技術

技術簡介

採用光學模擬及微結構分析,預測光學行為,藉由蝕刻方向控制技術,製作高穿透光擴散光學元件

Abstract

none

技術規格

可達到符合在285nm兩波長範圍,光學擴散角>10度,穿透度>85%之光擴散特性

Technical Specification

none

技術特色

可針對不同應用進行光學結構調整\製程穩定\可批次生產

應用範圍

半導體曝光機台用\LCD背光用光擴散元件

接受技術者具備基礎建議(設備)

塗佈機、曝光機、化學槽、鍍膜機

接受技術者具備基礎建議(專業)

材料、化工、機械

技術分類 電子有機材料

聯絡資訊

聯絡人:潘信宏 電子材料及元件研究組

電話:+886-3-5915983 或 Email:feelpan@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5820386

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