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工業技術研究院

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技術名稱: 發展大尺寸數位X光平板感測器之直接式光電轉換層

技術簡介

本技術使用真空蒸鍍法製備非晶硒,作為直接轉換式X光平板感測器之光電轉換層。透過蒸鍍製程參數的最佳化,使硒厚膜達高光電轉換效率。

Abstract

We fabricated the amorphous selenium (a-Se) photoconductor, utilizing the vacuum evaporation technique. The components and fabrication parameters in the evaporator were optimized to form an a-Se thick layer which achieved high conversion efficiency.

技術規格

1.硒厚膜具非結晶相且厚度約達200 μm 2.對X光的靈敏度達216 pC cm-2 mR-1 3.高壓封裝使大尺寸硒厚膜應用於X光平板感測器可耐1200 V電壓而不損壞

Technical Specification

1.The selenium film is provide to amorphous phase and thickness of about 200 μm 2.The photo-responsivity induced by X-ray photons is about 216 pC cm-2 mR-1. 3.As to the package of high bias voltage in this large size FPD, the current method could stand about 1200 V applied to an a-Se layer with 200 μm thickness without causing damage.

技術特色

本技術使用製程參數最佳化使光電轉換層達高光電轉換效率,並對光電轉換層進行溫控程序使光/暗電流的表現皆具改善效果。

應用範圍

X光平板感測器的影像偵測端

接受技術者具備基礎建議(設備)

1.真空蒸鍍系統 2.電性量測設備:微電流表、高壓電源、示波器與訊號產生器等

接受技術者具備基礎建議(專業)

1.真空鍍膜技術 2.半導體物理 3.材料分析技術

技術分類 醫療電子

聯絡資訊

聯絡人:呂慧歆 醫電與診斷技術中心

電話:+886-3-591-2178 或 Email:comet@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-591-2444

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