工業技術研究院

技術簡介

本氣體濃度計量技術主要提供高階標準混合氣的配製、氣體濃度驗證、及氣體純度分析服務，並針對氣體計量追溯之實現方法提供技術諮詢。標準混合氣體之配製系統主要依據ISO Guide 34，ISO 6142，ISO 6143與ISO 6145等國際標準規範執行，可提供產業與檢測實驗室之服務及應用範圍包含：客製化之標準混合氣體供應、高純度氣體規格驗證、標準氣體使用諮詢、標準氣體濃度校正(驗證)、實廠線上氣體濃度驗證、溫室氣體盤查檢測、空氣污染監測設備效能查核、室內空氣品質查核管制等，以確保量測結果的準確度，並可符合如空氣污染防制法、溫室氣體減量法、室內空氣品質管理法等法規之要求。

Abstract

The gas metrology group in Medical & Chemistry Research Laboratory provides services including 1) preparation of standard gas mixtures, 2) gas purity analysis, and 3) certification of gas standards. System for standard gas mixtures preparation follows series of ISO standards (ISO Guide 34, ISO 6142, ISO6143, and ISO 6145) to fulfill all metrological requirements, which can support industries and testing laboratories to ensure the measurement accuracy and sufficient product quality control. We provide industries with services including supply of standard gas mixtures, technical consultation, and certification of gas mixtures. The application could be performance check and evaluation of evidential or other gas testers/detectors/analyzers installed in public or factories for EHS concerns. Its application can be 1) purity and concentration analysis of energy gases, 2) measurement of greenhouse gas emissions, 3) Performance check of air pollutant monitoring system, 4) Control of indoor air quality (IAQ), and 5) purity analysis of process gases or specialty gases. We are developing metrological capabilities required to analyze key pollutants listed in regulations and rules related to environment protection and climate change, such as”Air Pollution Control Act”, “Greenhouse Gases Reduction Act”, and “Indoor Air Quality Control Ordinance”.

技術規格

1. 驗證參考混合氣(CRM)生產技術規格： CO in N2：(1.0 to 100) μmol/mol Ur=(1.0 to 3.0) % CO in N2：(>0.1 to 100) mmol/mol Ur=(0.2 to 1.0) % CO2 in N2：(100 to 1000) μmol/mol Ur=(0.2 to 1.2) % CO2 in N2：(>1.0 to 160) mmol/mol Ur=(0.1 to 0.8) % CH4 in N2：(100 to 1000) μmol/mol Ur=(0.8 to 1.0) % CH4 in N2：(>1.0 to 100) mmol/mol Ur=(0.1 to 0.8) % C3H8 in N2：(0.1 to 50) mmol/mol Ur=(0.5 to 1.0) % CF4 in N2：(100 to 3000) μmol/mol Ur=(0.3 to 1.0) % SF6 in N2：(10 to 1000) μmol/mol Ur=(0.5 to 1.5) % NO in N2：(50 to 2000) μmol/mol Ur=(0.8 to 2.0) % SO2 in N2：(50 to 2000) μmol/mol Ur=(0.5 to 1.5) % O2 in N2：(1.0 to 10) μmol/mol Ur=(1.5 to 3.0) % O2 in N2：(1.0 to 10) mmol/mol Ur=(0.5 to 1.5) % O2 in N2：(>10 to 250) mmol/mol Ur=(0.3 to 1.0) % CH4 in Air：(1.0 to 20) mmol/mol Ur=(0.3 to 0.8) % 2.純度分析(驗證)技術規格： Pure N2 : H2: L.O.D. 0.01 mmol/mol (GC-PDHID) CO: L.O.D. 0.02 mmol/mol (GC-PDHID) CO2: L.O.D. 0.06 μmol/mol (GC-FID) CH4: L.O.D. 0.06 μmol/mol (GC-FID) O2: L.O.D. 0.01 μmol/mol (Oxygen Analyzer) H2O: L.O.D. 0.02 μmol/mol (CRDS) Pure Ar: H2: L.O.D. 0.01 μmol/mol (GC-PDHID) N2: L.O.D. 0.02 μmol/mol (GC-PDHID) CO: L.O.D. 0.02 μmol/mol (GC-PDHID) CO2: L.O.D. 0.04 μmol/mol (GC-FID) CH4: L.O.D. 0.07 μmol/mol (GC-FID) O2: L.O.D. 0.01 μmol/mol (Oxygen Analyzer) H2O: L.O.D. 0.02 μmol/mol (CRDS) Pure O2: N2: L.O.D. 0.02 μmol/mol (GC-PDHID) CO: L.O.D. 0.02 μmol/mol (GC-PDHID) CO2: L.O.D. 0.05 μmol/mol (GC-FID) CH4: L.O.D. 0.05 μmol/mol (GC-FID) H2O: L.O.D. 0.02 μmol/mol (CRDS) Pure NF3: CO: L.O.D. 0.54 μmol/mol (FTIR) CO2: L.O.D. 0.10 μmol/mol (FTIR) CF4: L.O.D. 2.31 μmol/mol (FTIR) SF6: L.O.D. 0.06 μmol/mol (FTIR) N2O: L.O.D. 0.12 μmol/mol (FTIR) Pure CF4: O2: L.O.D. 1.97 μmol/mol (QMS) N2: L.O.D. 1.39 μmol/mol (QMS) CO: L.O.D. 0.40 μmol/mol (FTIR) SF6: L.O.D. 0.05 μmol/mol (FTIR) CH4: L.O.D. 0.18 μmol/mol (FTIR) CO2: L.O.D. 0.33 μmol/mol (GC-FID) Pure SF6: CO: L.O.D. 0.35 μmol/mol (FTIR) CF4: L.O.D. 0.02 μmol/mol (FTIR) CH4: L.O.D. 0.83 μmol/mol (FTIR) CO2: L.O.D. 0.54 μmol/mol (FTIR) Pure NO: CO: L.O.D. 0.46 μmol/mol (FTIR) NO2: L.O.D. 4.9 μmol/mol (FTIR) N2O: L.O.D. 10.4 μmol/mol (FTIR) CH4: L.O.D. 0.53 μmol/mol (FTIR) CO2: L.O.D. 0.08 μmol/mol (FTIR) Pure CO2: H2: L.O.D. 0.01 μmol/mol (GC-PDHID) O2: L.O.D. 0.01 μmol/mol (GC-PDHID) N2: L.O.D. 0.01 μmol/mol (GC-PDHID) CO: L.O.D. 0.03 μmol/mol (GC-FID) CH4: L.O.D. 0.05 μmol/mol (GC-FID) Zero Air: CH4: L.O.D. 0.01 μmol/mol (GC-FID) NO: L.O.D. 0.01 μmol/mol (NO Analyzer) SO2: L.O.D. 0.02 μmol/mol (GC-MS) CO: L.O.D. 0.05 μmol/mol (GC-FID) CO2: L.O.D. 0.05 μmol/mol (GC-FID) H2O: L.O.D. 0.02 μmol/mol (CRDS) 3.動態標準氣體生產技術規格： HCHO in N2: (1 to 10) μmol/mol H2O in N2: (0.1 to 50) μmol/mol NO in N2: (1 to 2000) μmol/mol Ur < 5.0 % SO2 in N2: (1 to 2000) μmol/mol Ur < 5.0 % C2H5OH in Air: (82 to 1200) μmol/mol U > 3 μmol/mol

Technical Specification

1. Technical Specification of CRM production： CO in N2：(1.0 to 100) μmol/mol Ur=(1.0 to 3.0) % CO in N2：(>0.1 to 100) mmol/mol Ur=(0.2 to 1.0) % CO2 in N2：(100 to 1000) μmol/mol Ur=(0.2 to 1.2) % CO2 in N2：(>1.0 to 160) mmol/mol Ur=(0.1 to 0.8) % CH4 in N2：(100 to 1000) μmol/mol Ur=(0.8 to 1.0) % CH4 in N2：(>1.0 to 100) mmol/mol Ur=(0.1 to 0.8) % C3H8 in N2：(0.1 to 50) mmol/mol Ur=(0.5 to 1.0) % CF4 in N2：(100 to 3000) μmol/mol Ur=(0.3 to 1.0) % SF6 in N2：(10 to 1000) μmol/mol Ur=(0.5 to 1.5) % NO in N2：(50 to 2000) μmol/mol Ur=(0.8 to 2.0) % SO2 in N2：(50 to 2000) μmol/mol Ur=(0.5 to 1.5) % O2 in N2：(1.0 to 10) μmol/mol Ur=(1.5 to 3.0) % O2 in N2：(1.0 to 10) mmol/mol Ur=(0.5 to 1.5) % O2 in N2：(>10 to 250) mmol/mol Ur=(0.3 to 1.0) % CH4 in Air：(1.0 to 20) mmol/mol Ur=(0.3 to 0.8) % 2.Technical Specification of Gas Purity Analysis： Pure N2 : H2: L.O.D. 0.01 μmol/mol (GC-PDHID) CO: L.O.D. 0.02 μmol/mol (GC-PDHID) CO2: L.O.D. 0.06 μmol/mol (GC-FID) CH4: L.O.D. 0.06 μmol/mol (GC-FID) O2: L.O.D. 0.01 μmol/mol (Oxygen Analyzer) H2O: L.O.D. 0.02 μmol/mol (CRDS) Pure Ar: H2: L.O.D. 0.01 μmol/mol (GC-PDHID) N2: L.O.D. 0.02 μmol/mol (GC-PDHID) CO: L.O.D. 0.02 μmol/mol (GC-PDHID) CO2: L.O.D. 0.04 μmol/mol (GC-FID) CH4: L.O.D. 0.07 μmol/mol (GC-FID) O2: L.O.D. 0.01 μmol/mol (Oxygen Analyzer) H2O: L.O.D. 0.02 μmol/mol (CRDS) Pure O2: N2: L.O.D. 0.02 μmol/mol (GC-PDHID) CO: L.O.D. 0.02 μmol/mol (GC-PDHID) CO2: L.O.D. 0.05 μmol/mol (GC-FID) CH4: L.O.D. 0.05 μmol/mol (GC-FID) H2O: L.O.D. 0.02 μmol/mol (CRDS) Pure NF3: CO: L.O.D. 0.54 μmol/mol (FTIR) CO2: L.O.D. 0.10 μmol/mol (FTIR) CF4: L.O.D. 2.31 μmol/mol (FTIR) SF6: L.O.D. 0.06 μmol/mol (FTIR) N2O: L.O.D. 0.12 μmol/mol (FTIR) Pure CF4: O2: L.O.D. 1.97 μmol/mol (QMS) N2: L.O.D. 1.39 μmol/mol (QMS) CO: L.O.D. 0.40 μmol/mol (FTIR) SF6: L.O.D. 0.05 μmol/mol (FTIR) CH4: L.O.D. 0.18 μmol/mol (FTIR) CO2: L.O.D. 0.33 μmol/mol (GC-FID) Pure SF6: CO: L.O.D. 0.35 μmol/mol (FTIR) CF4: L.O.D. 0.02 μmol/mol (FTIR) CH4: L.O.D. 0.83 μmol/mol (FTIR) CO2: L.O.D. 0.54 μmol/mol (FTIR) Pure NO: CO: L.O.D. 0.46 μmol/mol (FTIR) NO2: L.O.D. 4.9 μmol/mol (FTIR) N2O: L.O.D. 10.4 μmol/mol (FTIR) CH4: L.O.D. 0.53 μmol/mol (FTIR) CO2: L.O.D. 0.08 μmol/mol (FTIR) Pure CO2: H2: L.O.D. 0.01 μmol/mol (GC-PDHID) O2: L.O.D. 0.01 μmol/mol (GC-PDHID) N2: L.O.D. 0.01 μmol/mol (GC-PDHID) CO: L.O.D. 0.03 μmol/mol (GC-FID) CH4: L.O.D. 0.05 μmol/mol (GC-FID) Zero Air: CH4: L.O.D. 0.01 μmol/mol (GC-FID) NO: L.O.D. 0.01 μmol/mol (NO Analyzer) SO2: L.O.D. 0.02 μmol/mol (GC-MS) CO: L.O.D. 0.05 μmol/mol (GC-FID) CO2: L.O.D. 0.05 μmol/mol (GC-FID) H2O: L.O.D. 0.02 μmol/mol (CRDS) 3.Technical Specification of CRM Dynamic Production: HCHO in N2: (1 to 10) μmol/mol H2O in N2: (0.1 to 50) μmol/mol NO in N2: (1 to 2000) μmol/mol Ur < 5.0 % SO2 in N2: (1 to 2000) μmol/mol Ur < 5.0 % C2H5OH in Air: (82 to 1200) μmol/mol U > 3 μmol/mol

技術特色

本氣體濃度計量技術主要提供高階標準混合氣的配製、氣體濃度驗證、及氣體純度分析服務，並針對氣體計量追溯之實現方法提供技術諮詢。標準混合氣體之配製系統主要依據ISO Guide 34，ISO 6142，ISO 6143與ISO 6145等國際標準規範執行，可提供產業與檢測實驗室之服務及應用範圍包含：客製化之標準混合氣體供應、高純度氣體規格驗證、標準氣體使用諮詢、標準氣體濃度校正(驗證)、實廠線上氣體濃度驗證、溫室氣體盤查檢測、空氣污染監測設備效能查核、室內空氣品質查核管制等，以確保量測結果的準確度，並可符合如空氣污染防制法、溫室氣體減量法、室內空氣品質管理法等法規之要求。

應用範圍

能源氣體濃度驗證，溫室氣體盤查檢測，空氣污染防制濃度檢測，室內空氣品質管制，氣體供應純度分析，公務執法器材性能評估，工安衛監測器材與分析儀器校正與測試

接受技術者具備基礎建議（設備）

一、具備氣體相關分析儀器。(如FTIR、GC、QMS…) 或 二、具備氣體配製及秤重設備。

接受技術者具備基礎建議（專業）

一、儀器分析基本背景知識。 二、氣體配製基本知識與技術。 或 三、檢測/校正產品與儀器需求廠商

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