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工業技術研究院

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技術名稱: 電漿製程驗證平台技術

技術簡介

國內產業研發電漿製程ICP-RIE相關機台,尚必須克服在電漿源奈米尺度製程穩定性。以螺旋線圈電極技術進行設計,並搭配電漿源模組模擬分析,達到電漿平坦化需求

Abstract

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技術規格

螺旋線圈電場模擬與電極設計、電漿特性驗證測試平台、建構精密電漿蝕刻模組技術,ICP-RIE蝕刻電漿源模組,均勻度<5%,電漿密度>10^11 cm-3 ,電漿變異量<7%

Technical Specification

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技術特色

國內產業研發電漿製程ICP-RIE相關機台,尚必須克服在電漿源奈米尺度製程穩定性。以螺旋線圈電極技術進行設計,並搭配電漿源模組模擬分析,達到電漿平坦化需求

應用範圍

可應用於高功率LED、MEMS、 3D-IC電漿表面處理及蝕刻製程設備

接受技術者具備基礎建議(設備)

電磁場耦合與電漿模擬分析技術,電漿源電極和匹配功率源,蝕刻電漿源模組

接受技術者具備基礎建議(專業)

材料化學、機械、電漿技術

技術分類 精密機械

聯絡資訊

聯絡人:林士欽 新興能源機械技術組

電話:+886-3-5918777 或 Email:evalee@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5910350

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