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工業技術研究院

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技術名稱: 雷射散射技術

技術簡介

本技術透過雷射散射儀用於計算半導體晶圓的檢測方法及工具,在技術上散射光的亮度會隨雷射光入射角度變化

Abstract

This inspection method and system is the use of laser scattering for semiconductor wafers.

技術規格

可量測解析>500nm

Technical Specification

Defect Resolution> 500nm

技術特色

本技術透過雷射散射儀用於計算半導體晶圓的檢測方法及工具,在技術上散射光的亮度會隨雷射光入射角度變化

應用範圍

半導體產業

接受技術者具備基礎建議(設備)

散射圖譜擷取模組

接受技術者具備基礎建議(專業)

光學相關背景

技術分類 先進檢測與感測儀器- 檢測/設備技術

聯絡資訊

聯絡人:卓嘉弘 量測技術發展中心

電話:+886-3-5743817 或 Email:Gabo_Cho@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5722383

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