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工業技術研究院

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技術名稱: 高密度電漿模組技術

技術簡介

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Abstract

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技術規格

電漿密度1011/cm^3,操作功率1~5KW,電漿面積可達900mmx600mm

Technical Specification

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技術特色

自主開發高密度ICP-CVD電漿鍍膜技術,單一腔體連續製備SiOCH複合薄膜,具高阻水氣性、殊水硬化特性。

應用範圍

OLED封裝、車燈鍍膜、晶圓蝕刻

接受技術者具備基礎建議(設備)

RF-Generator & Matching,控壓Pump系統

接受技術者具備基礎建議(專業)

真空設備, 電漿製程, 薄膜分析

技術分類 FY105-先進製造應用

聯絡資訊

聯絡人:廖金二 L200

電話:+886-6-6939109 或 Email:artliao@itri.org.tw

客服專線:+886-800-45-8899

傳真:none

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