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工業技術研究院

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技術名稱: 單/多晶矽太陽電池製作技術

技術簡介

使用較低成本之矽晶片材料及利用簡單可量產的製程技術如網印燒結法製作金屬電極方式來製作低成本、高效率的單晶矽太陽電池。電池結構和製程簡單可適合大量生產。可運用於一般消費性電子產品之電源或發電系統上。

Abstract

Low cost and high efficiency silicon solar cells are fabricated on a low cost silicon substrate, meanwhile, the cost can be further reduced by co-firing method to form metal grids. This structure and processing method are very suitable to mass production, which can be applied to power source or generator of general consuming electronic products.

技術規格

5~6吋之單晶矽及多晶矽太陽電池,開路電壓Voc≧640mV(單晶); Voc≧630mV(多晶),光電流密度Jsc≧38mA/cm2(單晶); Jsc≧37mA/cm2(多晶),單晶矽轉換效率≧20%、多晶矽轉換效率≧18%。

Technical Specification

1. 5 or 6 inch mono/multi crystalline silicon solar cell. 2. open voltage≧630V(mono), ≧630V(multi) 3. short circuit current ≧38mA/cm2 ;(mono), ≧37mA/cm2 (multi) 4. cell efficiency≧20% (mono), ≧18% (multi)

技術特色

包含1. 表面織化技術, 2. PN接面技術, 3. 抗反射層技術, 金屬電極技術,

應用範圍

1.可發電之太陽電池模板。 2.發電系統。 3.照明、通訊、及消費性電子產品之等電力供應。

接受技術者具備基礎建議(設備)

具有太陽電池製造, 模組封裝相關設備

接受技術者具備基礎建議(專業)

具有太陽電池製造, 模組封裝相關經驗

技術分類 01 綠能環境

聯絡資訊

聯絡人:許世朋 太陽光電技術組

電話:06-3636822 或 Email:SpencerHsu@itri.org.tw

客服專線:+886-800-45-8899

傳真:none

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