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工業技術研究院

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技術名稱: 鍍膜製程優化技術

技術簡介

創新「多重物理化學耦合技術」,整合熱流場、氣流場、電漿場及化學場等,建立薄膜製程AI-Enhanced Simulator ,精進提昇品質預測準確度95%以上

Abstract

Innovative "Multiple physical-chemical coupling technology", integrating heat flow field, air flow field, plasma field and chemical field, etc., to establish a thin film process AI-Enhanced Simulator,, which improves the accuracy of quality prediction by more than 95%

技術規格

鍍率與膜厚均勻性之準確率95%

Technical Specification

accuracy(deposition rate and film thickness uniformity)95%

技術特色

整合「多重物理化學耦合技術」,建立薄膜製程AI-Enhanced Simulator ,從人為製程調控邁向智慧化,建構新產品快速彈性研發優勢

應用範圍

光電半導體、下世代顯示器、太陽能光電、無線通訊,高效率功率電晶體等產品的製造

接受技術者具備基礎建議(設備)

光電半導體之鍍膜設備與製程技術

接受技術者具備基礎建議(專業)

專業人才:光電鍍膜製程開發、光電鍍膜製程技術或熱流與化學反應模擬分析技術

技術分類 光電與半導體製程設備

聯絡資訊

聯絡人:黃智勇 工業物聯網技術組(0G000)

電話:+886-3-5916695 或 Email:huangcy@itri.org.tw

客服專線:+886-800-45-8899

傳真:+886-3-5910350

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